Photochemical lithography: Creation of patterned, acid chloride functionalized surfaces using UV light and gas-phase oxalyl chloride

G. A. Husseini; T. L. Niederhauser; J. G. Peacock; M. R. Vernon; Y. Y. Lua; M. C. Asplund; E. T. Sevy; M. R. Linford

doi:10.1021/la020896g

Photochemical lithography: Creation of patterned, acid chloride functionalized surfaces using UV light and gas-phase oxalyl chloride

G. A. Husseini
, T. L. Niederhauser
, J. G. Peacock
, M. R. Vernon
, Y. Y. Lua
, M. C. Asplund^*
, E. T. Sevy
, M. R. Linford

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

Acyl chloride moieties (-COCl) were introduced into and patterned onto methyl-terminated monolayers through a photoreaction using gas-phase oxalyl chloride (COCl)₂ and 367 nm light. The resulting surfaces are amine-reactive.

Original language	English
Pages (from-to)	4856-4858
Number of pages	3
Journal	Langmuir
Volume	19
Issue number	11
DOIs	https://doi.org/10.1021/la020896g
State	Published - 27 May 2003
Externally published	Yes

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title = "Photochemical lithography: Creation of patterned, acid chloride functionalized surfaces using UV light and gas-phase oxalyl chloride",

abstract = "Acyl chloride moieties (-COCl) were introduced into and patterned onto methyl-terminated monolayers through a photoreaction using gas-phase oxalyl chloride (COCl)2 and 367 nm light. The resulting surfaces are amine-reactive.",

author = "Husseini, \{G. A.\} and Niederhauser, \{T. L.\} and Peacock, \{J. G.\} and Vernon, \{M. R.\} and Lua, \{Y. Y.\} and Asplund, \{M. C.\} and Sevy, \{E. T.\} and Linford, \{M. R.\}",

year = "2003",

month = may,

day = "27",

doi = "10.1021/la020896g",

language = "English",

volume = "19",

pages = "4856--4858",

journal = "Langmuir",

issn = "0743-7463",

publisher = "American Chemical Society",

number = "11",

}

TY - JOUR

T1 - Photochemical lithography

T2 - Creation of patterned, acid chloride functionalized surfaces using UV light and gas-phase oxalyl chloride

AU - Husseini, G. A.

AU - Niederhauser, T. L.

AU - Peacock, J. G.

AU - Vernon, M. R.

AU - Lua, Y. Y.

AU - Asplund, M. C.

AU - Sevy, E. T.

AU - Linford, M. R.

PY - 2003/5/27

Y1 - 2003/5/27

N2 - Acyl chloride moieties (-COCl) were introduced into and patterned onto methyl-terminated monolayers through a photoreaction using gas-phase oxalyl chloride (COCl)2 and 367 nm light. The resulting surfaces are amine-reactive.

AB - Acyl chloride moieties (-COCl) were introduced into and patterned onto methyl-terminated monolayers through a photoreaction using gas-phase oxalyl chloride (COCl)2 and 367 nm light. The resulting surfaces are amine-reactive.

UR - https://www.scopus.com/pages/publications/0037905345

U2 - 10.1021/la020896g

DO - 10.1021/la020896g

M3 - Article

AN - SCOPUS:0037905345

SN - 0743-7463

VL - 19

SP - 4856

EP - 4858

JO - Langmuir

JF - Langmuir

IS - 11

ER -

Photochemical lithography: Creation of patterned, acid chloride functionalized surfaces using UV light and gas-phase oxalyl chloride

Abstract

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